Skip to main content

TECHNOLOGY

Our Technology

From carbon-bearing gas to single-crystal diamond — the MPCVD method with a fully in-house process chain.

GROWTH SEQUENCE

The CVD Growth Sequence

Using a diamond seed, microwave energy dissociates carbon gas into atoms that deposit layer by layer into a single crystal. Click each stage to learn more.

01

Seed Seed

A diamond crystal acts as the substrate/seed

PRODUCTION METHOD

Diamond Production Methods

Mined Diamond

High extraction cost, harms the environment

ENTASK's choice

CVD (Chemical Vapor Deposition)

High clarity, with a technical edge for large-carat production

HPHT (High Pressure High Temperature)

Lower clarity, with weak magnetism

MPCVD GROWTH METHOD

The MPCVD Growth Method

Microwave heating and discharge activate a carbon-bearing gas (e.g. methane), dissociating it into carbon and hydrogen atoms (or CH3 + H). The free carbon atoms form diamond. At 800–1000°C and ~0.1 atm CH4+H2, excess H2 partial pressure tends to form graphite; a diamond crystal serves as the seed substrate, growing at 5–50 μm/h.

Growth temperature800-1000 ℃
Atmosphere0.1 atm CH4+H2
Growth rate5-50 μm/h
SubstrateDiamond crystal (seed)
MPCVD 生长法
工艺流程1
工艺流程2
工艺流程3

PROCESS CONTROL

Ultra-Precise Process Control

Ensuring large-size, high-grade diamond growth.

±0.005 kPa

Chamber pressure stability

Dynamic edge-uniformity control and multi-parameter thermal modeling ensure large-area uniformity and thermal stability.

≥99% single-run

High yield

Advanced chamber design, gas-flow control and intelligent alerts; ≥93% composite yield over multiple growth cycles.

40+ items

Full in-house IP

Full independent IP across core systems, growth process and intelligent controls — 40+ patents & software copyrights (to be verified).

[PLACEHOLDER: IMG-PLASMA-001]Plasma GlowSuggested ratio 16:10Awaiting company photo
[PLACEHOLDER: IMG-REACTOR-001]CVD Reactor ChamberSuggested ratio 16:10Awaiting company photo

See how our systems power this process