TECHNOLOGY
Our Technology
From carbon-bearing gas to single-crystal diamond — the MPCVD method with a fully in-house process chain.
GROWTH SEQUENCE
The CVD Growth Sequence
Using a diamond seed, microwave energy dissociates carbon gas into atoms that deposit layer by layer into a single crystal. Click each stage to learn more.
Seed Seed
A diamond crystal acts as the substrate/seed
PRODUCTION METHOD
Diamond Production Methods
Mined Diamond
High extraction cost, harms the environment
CVD (Chemical Vapor Deposition)
High clarity, with a technical edge for large-carat production
HPHT (High Pressure High Temperature)
Lower clarity, with weak magnetism
MPCVD GROWTH METHOD
The MPCVD Growth Method
Microwave heating and discharge activate a carbon-bearing gas (e.g. methane), dissociating it into carbon and hydrogen atoms (or CH3 + H). The free carbon atoms form diamond. At 800–1000°C and ~0.1 atm CH4+H2, excess H2 partial pressure tends to form graphite; a diamond crystal serves as the seed substrate, growing at 5–50 μm/h.
PROCESS CONTROL
Ultra-Precise Process Control
Ensuring large-size, high-grade diamond growth.
±0.005 kPa
Chamber pressure stability
Dynamic edge-uniformity control and multi-parameter thermal modeling ensure large-area uniformity and thermal stability.
≥99% single-run
High yield
Advanced chamber design, gas-flow control and intelligent alerts deliver single-run yield and batch-to-batch consistency.
In-house
Full in-house IP
Independent IP across core systems, growth process and intelligent controls; published invention patent applications CN119269411A (360-degree stress analyser for transparent crystals) and CN120178750A (industrial communication system for semiconductor equipment) — published by CNIPA, not yet granted.