MPCVD Growth Systems

In-house 10kW E-MG010K industrial source, redundant cooling, MTBF >10,000h, extended warranty on source and head.

Seamless switching across 5 microwave-source and 2 MFC brands; quartz/cylindrical/butterfly chambers and 5 gas lines with real-time self-check.

Optimized sealing and stability, <50dB operation, greatly extended seal life.

1500-hour non-stop validated; chamber needs no special cleaning.

ABB and Siemens control systems, high-grade industrial components.

19-inch standard industrial rack, supporting multi-system stacking and flexible line expansion.

Integrates 8 standard modules: air, water, vacuum, electrical, IPC, microwave source, process gas, and SCADA server — plug-and-play coordinated control.

Innovative growth-edge control for large-area uniformity in manual/auto modes.

Pressure stability ±0.005kPa, for high-precision single/poly-crystal deposition.

Balanced control of high-flow gas lines, avoiding gas-jetting during changes.

Multi-parameter coupled thermal model for stable, even temperatures during auto runs.

Single-run yield stable at 2N (99%); ≥93% composite over 7 growth cycles per batch.

High-precision rotary-encoder closed-loop control of temperature, pressure, power and time, avoiding touchscreen menu errors.

Coaxial in-chamber injection of microwave field and process gas boosts efficiency and symmetry; new materials/sealing overcome quartz vacuum/temperature limits.

One-piece waveguide with water cooling; <5°C rise over 1500h high-power/high-methane use; loss/leakage 10% below national standard.

One-piece stage greatly extends life; no degradation of surface flatness or thermal conductivity over long use.

Multi-modal visual interface with IPC for real-time parameter monitoring/traceability, reserving interfaces for robotic production.

Factory-level electronic dashboards for centralized cluster control.

Built-in remote module for cross-platform data and cloud iteration of process parameters across sites.

Profinet and TCP/IP for lab information systems, serving university research.

Real-time deposition imaging and integrated analytics for process control and upgrades.

One-touch smart temperature programs reduce errors; real-time fault analysis and alerts for gas, air, water.

Reserved AI software and robotic growth functions.

Independent air control can eliminate the air compressor, cutting energy use and improving stability.

Redesigned cooling with special control of heat dissipation/condensation/loss, plus water-quality monitoring and treatment.

Key components are plug-and-play for easy factory servicing.

Auto-eject chamber compatible with robotic arms, greatly improving cleaning efficiency for unmanned lines.

Self-cleaning chamber process reduces maintenance frequency without special chemical cleaning.