MPCVD EQUIPMENT

MPCVD Growth Systems

Name: MPCVD Growth Systems
Brand: ENTASK

Gen-4.5 and Gen-5 systems available, in-house microwave source, MTBF >10,000 h.

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GENERATIONS

Gen-4 / Gen-4.5 / Gen-5 Systems

We currently lead sales with Gen-4.5 and Gen-5 — Gen-5 offers a larger growth stage and higher output.

Parameter	Gen-4	Gen-4.5	Gen-5
Availability	Classic	In production	In production
Frequency	2450MHz	2450MHz	2450MHz
Power	10kW	10kW	10-15kW
Growth stage	92mm	102mm	120mm
Max growth thickness	12mm	15mm	15mm
Standard product	20×15×9.5mm SC	21×17×9.7mm SC	24×18×10mm SC
Output per run	14 stones/run	20 stones/run	Per configuration
Monthly capacity	200ct/system·mo	300ct/system·mo	Per configuration
Microwave source MTBF	>10000 hrs	>10000 hrs	>10000 hrs

SIX SYSTEMS

Six Core Systems

From high-power deposition to automated maintenance — fully developed in-house.

1.1
High-power microwave plasma deposition
Supports uniform 92mm diamond growth at 10kW, 12mm crystal height, and 15kW/120mm.
1.2
Crystal growth-rate breakthrough
At 10kW: FG 8-10μm/h, EF 6-7μm/h, DE 5-6μm/h; high-quality poly (1800W/m·K) at 2μm/h.
1.3
Polycrystalline deposition
Supports 102.6mm and 120mm optical-grade polycrystalline and thermal-composite growth.
1.4
High-grade rough production
Single run yields 700 ct high-grade rough over 3 months (tested), producing 250 ct polished.

2.1
Reliable microwave power system
In-house 10kW E-MG010K industrial source, redundant cooling, MTBF >10,000h, extended warranty on source and head.
2.2
Multi-source modular architecture
Seamless switching across 5 microwave-source and 2 MFC brands; quartz/cylindrical/butterfly chambers and 5 gas lines with real-time self-check.
2.3
Long-life low-noise design
Optimized sealing and stability, <50dB operation, greatly extended seal life.
2.4
Extended continuous operation
1500-hour non-stop validated; chamber needs no special cleaning.
2.5
Industrial control standard
ABB and Siemens control systems, high-grade industrial components.
2.6
Standard rack integration
19-inch standard industrial rack, supporting multi-system stacking and flexible line expansion.
2.7
Modular architecture
Integrates 8 standard modules: air, water, vacuum, electrical, IPC, microwave source, process gas, and SCADA server — plug-and-play coordinated control.

3.1
Dynamic edge-uniformity control
Innovative growth-edge control for large-area uniformity in manual/auto modes.
3.2
Ultra-precise pressure closed-loop
Pressure stability ±0.005kPa, for high-precision single/poly-crystal deposition.
3.3
High-flow gas balancing
Balanced control of high-flow gas lines, avoiding gas-jetting during changes.
3.4
Thermal-field stability
Multi-parameter coupled thermal model for stable, even temperatures during auto runs.
3.5
Production-grade yield
Single-run yield stable at 2N (99%); ≥93% composite over 7 growth cycles per batch.
3.6
Control-system optimization
High-precision rotary-encoder closed-loop control of temperature, pressure, power and time, avoiding touchscreen menu errors.
3.7
Chamber design optimization
Coaxial in-chamber injection of microwave field and process gas boosts efficiency and symmetry; new materials/sealing overcome quartz vacuum/temperature limits.
3.8
Microwave transmission parts
One-piece waveguide with water cooling; <5°C rise over 1500h high-power/high-methane use; loss/leakage 10% below national standard.
3.9
Growth-stage component
One-piece stage greatly extends life; no degradation of surface flatness or thermal conductivity over long use.

4.1
Real-time monitoring & smart HMI
Multi-modal visual interface with IPC for real-time parameter monitoring/traceability, reserving interfaces for robotic production.
4.2
Digital production platform
Factory-level electronic dashboards for centralized cluster control.
4.3
Remote collaborative management
Built-in remote module for cross-platform data and cloud iteration of process parameters across sites.
4.4
Research-grade networking
Profinet and TCP/IP for lab information systems, serving university research.
4.5
Data visualization & analysis
Real-time deposition imaging and integrated analytics for process control and upgrades.
4.6
Intelligent process & alerts
One-touch smart temperature programs reduce errors; real-time fault analysis and alerts for gas, air, water.
4.7
AI & automation-ready
Reserved AI software and robotic growth functions.

5.1
Efficient air-system control
Independent air control can eliminate the air compressor, cutting energy use and improving stability.
5.2
Smart thermal management
Redesigned cooling with special control of heat dissipation/condensation/loss, plus water-quality monitoring and treatment.

6.1
Rapid maintenance
Key components are plug-and-play for easy factory servicing.
6.2
Automated chamber handling
Auto-eject chamber compatible with robotic arms, greatly improving cleaning efficiency for unmanned lines.
6.3
Maintenance-free cleaning
Self-cleaning chamber process reduces maintenance frequency without special chemical cleaning.

GALLERY

Equipment Gallery

Complete systems, control units, and cluster monitoring dashboards.

MODEL SHOWCASE · IMAGES COMING SOON

Product PhotoPhotography in progress

GEN-4.5

Gen-4.5 MPCVD System

Photography in progress

Product PhotoPhotography in progress

GEN-5

Gen-5 MPCVD System

Photography in progress

CVD Reactor ChamberPhotography in progress

Plasma GlowPhotography in progress

SPECIFICATIONS

Specifications

Specifications · SPECIFICATIONS

Parameter	Value
Available models	Gen-4.5 / Gen-5 (Gen-4 available)
Microwave source	In-house E-MG010K, 2450 MHz
Microwave power	10 kW / 15 kW
Growth area / crystal height	92mm / 12mm at 10 kW; 120mm at 15 kW
Control platform	InsightAction, WiseAction
Microwave source MTBF	> 10,000 hours
Full-load continuous run	> 1500 hours trouble-free
Chamber pressure stability	±0.005 kPa
Operating noise	< 50 dB
Control system	Siemens s7-1200 + Profinet + IPC vision
Monthly output per system	200-300 ct
Record per run	856 ctJanuary 2026; combined output of multiple seeds in one run, not one crystal's weight
System price	Quoted per configuration
Lead time	Confirmed per configuration and production schedule

APPLICATIONS

Applications

Diamond growers
HPHT makers expanding to CVD
Universities / research institutes
Diamond industry bases

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SUPPLY CAPABILITY

In-house systems, in-house material: the process window is ours to adjust

ENTASK is both an MPCVD system manufacturer and a diamond material producer. The microwave power source (in-house E-MG010K, 2450 MHz, 10 kW / 15 kW), chamber, intelligent controls and growth process are all developed in-house: 10 kW supports uniform growth across a 92mm area with 12mm crystal height, while 15 kW reaches a 120mm growth area. Equipment and process iterate under one roof.

That yields two practical advantages. First, process parameters can be tuned per order, supporting custom non-standard sizes (rough at 30×30×15 / 35×35×12 mm — the largest formats ENTASK has delivered at equal grade: D-E colour, VVS-VS clarity, Type IIa). Second, system reliability directly determines delivery consistency: our in-house microwave source has an MTBF over 10,000 hours and runs 1,500+ hours at full load trouble-free.

ENTASK is ISO 9001:2015 certified, output can be graded by IGI and other leading laboratories, and we supply customers in mainland China as well as India, the Middle East, Europe and the United States.

Microwave power: 10 / 15 kW
Growth area / height: 92mm / 12mm @10kW · 120mm @15kW
Microwave source MTBF: > 10,000 h
Chamber pressure stability: ±0.005 kPa
Single-run yield: ≥ 99%