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CVD DIAMOND · MPCVD EQUIPMENT

From seed to rough,
growing every carbon layer with precision

ENTASK is vertically integrated: we design and build our own MPCVD reactors and grow our own CVD diamond rough — custom formats up to 35×35×12 mm in D-E colour, VVS-VS clarity, Type IIa — plus optical windows and single-crystal heat spreaders.

35×35×12
max custom size (mm)
D/E
color grade
VVS/VS
clarity
Large-carat CVD diamond rough
≥ 99%Single-run yield
> 10,000 hMicrowave source MTBF
±0.005 kPaChamber pressure stability
92 / 120 mmGrowth area (10 / 15 kW)
ISO 9001Quality certified
D/E · VVS/VSRough colour / clarity

FROM SEED TO ROUGH

The journey of
a diamond

From a single seed to a fully traceable rough — precision-controlled at every step of the MPCVD process.

CVD diamond growth seed crystal
01

The Seed

A high-grade diamond crystal substrate — intact form, low defects — the starting point of single-crystal growth.

Multi-dimensional vision and spectral analysis
02

The Plasma

A 10-15 kW microwave activates a CH4+H2 mix, dissociating reactive carbon atoms into a stable plasma ball.

The MPCVD diamond growth method
03

Layer by Layer

Carbon deposits atom by atom on the seed at 800-1000°C, 0.1 atm, growing a single crystal at 5-50μm/h.

14 rough plates weighed at 713.1 ct
04

The Rough

Stable per-run output of standard rectangular forms — 20×15×9.5 to 24×18×10 mm, custom to 35×35×12 mm, D/E colour, VVS/VS clarity, Type IIa.

IGI grading report: 10.80 ct, D colour, VVS2, Type IIa lab-grown CVD diamond
05

Certified

Cut and polished into stones, certifiable by IGI and other leading labs — fully traceable quality.

CORE CAPABILITIES

Core Capabilities

Stable mass-production built on in-house MPCVD systems and a fully in-house process chain.

856ct

Record output per run

200-300ct/month

Per-system capacity

35×35×12mm

Largest custom format

Gen-4.5/5

MPCVD systems on sale

TECHNOLOGY

The MPCVD Growth Method

Microwave energy dissociates carbon-bearing gas into carbon atoms, depositing layer by layer onto a diamond seed to grow a single crystal.

Explore the technology →
Growth temperature
800–1000 ℃
Atmosphere
0.1 atm CH₄+H₂
Growth rate
5–50 μm/h
Microwave source
2450 MHz · 10/15 kW

MANUFACTURING

Manufacturing & Capacity

In-house E-MG010K microwave power source (10/15 kW) and intelligent control platforms, with MTBF over 10,000 hours.

ENTASK MPCVD diamond growth system
January 2026: record 856 ct per run

856 ct per run, capacity keeps breaking records

In Jan 2026, diamond rough reached 856 ct per run — a record. Since Gen-2 production in 2024, per-run output has climbed steadily from 300 ct.

Microwave source MTBF> 10,000 h
Full-load continuous run> 1500 h
Chamber pressure stability±0.005 kPa

QUALITY

Quality & Certification

ISO 9001:2015 certified, with end-to-end quality control across 20+ critical process checkpoints.

ISO 9001 quality management system certificate

ISO 9001:2015

Quality management system certified

IGI grading report: 10.80 ct, D colour, VVS2, Type IIa lab-grown CVD diamond

IGI Grading Certificate

10.80ct D VVS2 · Type IIa

WiseAction remote centralised control platform

Process Monitoring

Remote centralised control platform monitoring growth parameters in real time

Ready to get a quote?

Send us your specifications and quantities — our technical and sales teams will provide rough, functional material, or equipment solutions.